In this way, both the illumination wavefront and a phase-sensitive sample micrograph are jointly retrieved. The scan points are chosen in such a way that diffraction patterns from adjacent positions contain overlapping information. A sequence of diffraction patterns is collected on a pixelated detector while the specimen is laterally translated through a focused beam (compare Fig. These capabilities are afforded by data-driven techniques. In particular, the emergence of ptychography 21, 22 has offered a solution to some of the main problems encountered with EUV radiation: its lensless operation principle avoids absorptive losses, aberrations induced by the image forming optics, and its ability to perform wavefront sensing enables the deconvolution of illumination-induced aberrations, resulting in quantitative phase imaging (QPI). These highly coherent EUV sources have shown promising results using lensless imaging 18, 19, 20.
Recently, EUV sources driven by high-harmonic generation (HHG) have experienced tremendous progress 15, 16, 17, which resulted in increased photon flux and stability. Imaging techniques have successfully been transferred from large-scale facilities 10, such as synchrotrons and free-electron lasers, to laboratory-scale sources such as soft X-ray lasers 11, 12, 13 and laser-plasmas 14.
In the past decade, imaging at EUV wavelengths has undergone a transformation. The electromagnetic region below the silicon L edge is therefore referred to as the silicon transparency window-an ideal testbed for silicon-based substrates and functional materials. Likewise, in comparison to electrons, EUV photons can shed light into the interior of silicon-based environments. Moreover, at 13.5 nm the penetration depth of EUV photons in silicon is orders of magnitude higher than many elements across the periodic table. The electronic structure of tin plasmas provides prominent emission peaks at 13.5 nm wavelength 6, 7, while multilayer mirrors such as Mo/Si and Mo/Be reach reflectivities of up to 70% 8, 9. The extreme ultraviolet lithography (EUVL) node at 13.5 nm wavelength was selected as a reasoned choice. In this way, the complex transmission of an integrated circuit is precisely reconstructed, allowing for the classification of the material composition of mesoscopic semiconductor systems.Īdvances in nano-scale metrology of silicon-based devices are crucial for progress in diverse fields, with applications spanning from semiconductor miniaturization 1, energy conversion, and storage, such as next-generation solar cells 2 and battery materials 3, to nanostructures with advanced optical functionality, like metamaterials 4 and photonic circuits 5. Moreover, we propose mixed-state orthogonal probe relaxation ptychography, enabling robust phase-contrast imaging over wide fields of view and long acquisition times. By utilizing structured EUV illumination, we overcome the limitations of conventional EUV focusing optics and demonstrate high-resolution microscopy at a half-pitch lateral resolution of 16 nm. We combine a highly stable, high photon-flux, table-top EUV source with an interferometrically stabilized ptychography setup. Here, we present high-resolution and material-specific microscopy at 13.5 nm wavelength. It thus enables a nano-scale view into complex three-dimensional structures that are important for material science, semiconductor metrology, and next-generation nano-devices. At the same time, EUV radiation has significantly larger penetration depths than electrons. Create a unique feel for your room or workspace with the flexible scope of application offered by track lights from our Singapore suppliers! With aesthetics ranging from the utilitarian to the glamorous, these lights can be adapted to suit rooms of any purpose or style.Ĭheck out some of our best-selling Table Lamps! Select from our top Table Lamps brands at unbeatable quality.Microscopy with extreme ultraviolet (EUV) radiation holds promise for high-resolution imaging with excellent material contrast, due to the short wavelength and numerous element-specific absorption edges available in this spectral range. Table Lamps are the perfect lighting option for dining area s, living room s, study room and bed room. Horizon light, showcase best of the best table lamp This research explains why a simple table light if placed on the study desk could result in productivity. Table lamp could create focal point and this captures our attention creating a psychological space. Different from other furniture in the house because of its illumination prosperities. Table lamp is still a good selling lighting in todays context because studies showed that ambience is am important psychological trigger. Sort by: Are table lamps still applicable?
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